Study programmeFrançais
Plasma Technology for the Treatment of Materials
Programme component of Master's Degree in Physics Research Focus à la Faculty of Science
CodeTypeHead of UE Department’s
contact details
Teacher(s)
US-M1-PHYSFA-028-MOptional UESNYDERS RonyS882 - Chimie des Interactions Plasma-Surface
  • SNYDERS Rony

Language
of instruction
Language
of assessment
HT(*) HTPE(*) HTPS(*) HR(*) HD(*) CreditsWeighting Term
  • Français
Français15015003.00100.00

AA CodeTeaching Activity (AA) HT(*) HTPE(*) HTPS(*) HR(*) HD(*) Term Weighting
S-CHIM-120Plasma Technology for the Treatment of Materials (Part A)1501500Q1100.00%
Unité d'enseignement

Objectives of Programme's Learning Outcomes

  • Master expertise.
    • Have developed the knowledge and skills acquired in the previous cycle to a level that extends beyond the Bachelor's course in Physics, and which provides the basis for the development and implementation of original ideas in a professional context.
    • Have acquired knowledge and a thorough understanding of specialist areas of physics in connection with mathematics and/or advanced laboratory practices required for these sectors.
    • Have reached a level of knowledge and skill giving them access to the third cycle of the study programme / doctoral studies (only for two-year Master courses).
  • Collaborate and work in a team.
    • Have developed practical skills in physics through practical sessions in the laboratory and sessions during which they have worked individually and in groups.
  • Grow personally and professionally.
    • Have developed the skills that will enable them to continue to acquire knowledge independently.
  • Have a creative and rigorous scientific approach
    • Gather and interpret relevant scientific data and critically analyse it, distinguising working hypotheses of proven facts.
    • Apply their knowledge, understanding and ability to solve problems in new or unfamiliar environments and in multidisciplinary contexts related to physical sciences.
  • Collaborate and work in a team.
    • Have developed practical skills in physics through practical sessions in the laboratory and sessions during which they have worked individually and in groups.

Learning Outcomes of UE

At the end of the course the student will be able to: - Describe the specificities of cold plasma - Describe the operation of a magnetron discharge - Describe the operation of a PECVD process - Explain the mechanisms involved in the synthesis of thin films by plasma technologies

Content of UE

Description of the plasma environment, characteristics of cold plasma, magnetron sputtering (reactive), pulsed methods, PECVD processes, plasma polymerization, thin film growth

Prior Experience

Kinetic theory of gases , electricity, atomic structure , statistical distributions , electromagnetic spectrum, diffusion phenomenon , crystal structure of solids, spectroscopic characterization of surfaces

Type of Assessment for UE in Q1

  • Oral examination

Q1 UE Assessment Comments

Written exam using the course notes. Reading and discussion around a research paper related to the course.

Type of Assessment for UE in Q2

  • N/A

Q2 UE Assessment Comments

Not applicable

Type of Assessment for UE in Q3

  • Oral examination

Q3 UE Assessment Comments

Written exam using the course notes. Reading and discussion around a research paper related to the course.

Q1 UE Resit Assessment Comments (BAB1)

Not applicable

Type of Teaching Activity/Activities

AAType of Teaching Activity/Activities
S-CHIM-120
  • Cours magistraux
  • Conférences
  • Préparations, travaux, recherches d'information

Mode of delivery

AAMode of delivery
S-CHIM-120
  • Face to face

Required Reading

AA
S-CHIM-120

Required Learning Resources/Tools

AARequired Learning Resources/Tools
S-CHIM-120Slides containing the figures are available

Recommended Reading

AA
S-CHIM-120

Recommended Learning Resources/Tools

AARecommended Learning Resources/Tools
S-CHIM-120Not applicable

Other Recommended Reading

AAOther Recommended Reading
S-CHIM-120B. Chapman, Glow Discharge Processes: Sputtering and Plasma Etching, Wiley & Sons D. L. Smith, Thin Films Deposition, McGraw-Hill, Inc. M. Ohring, Materials Sciences of Thin Films, Academic Press

Grade Deferrals of AAs from one year to the next

AAGrade Deferrals of AAs from one year to the next
S-CHIM-120Autorisé
Date de génération : 17/03/2017
20, place du Parc, B7000 Mons - Belgique
Tél: +32 (0)65 373111
Courriel: info.mons@umons.ac.be