| Code | Lecturer(s) | Associate Lecturer(s) | Subsitute Lecturer(s) et other(s) |
|---|---|---|---|
| S-CHIM-120 |
|
| Language of instruction | Language of assessment | HT(*) | HTPE(*) | HTPS(*) | HR(*) | HD(*) | Term |
|---|---|---|---|---|---|---|---|
| Français | Français | 15 | 0 | 15 | 0 | 0 | Q1 |
Contents
Description of the plasma environment, characteristics of cold plasma, magnetron sputtering (reactive), pulsed methods, PECVD processes, plasma polymerization, thin film growth
Required Learning Resources/Tools
Slides containing the figures are available
Recommended Learning Resources/Tools
Not applicable
Other Recommended Reading
B. Chapman, Glow Discharge Processes: Sputtering and Plasma Etching, Wiley & Sons D. L. Smith, Thin Films Deposition, McGraw-Hill, Inc. M. Ohring, Materials Sciences of Thin Films, Academic Press
Mode of delivery
- Face to face
Term 1 Assessment - type
- Oral examination
Term 1 Assessment - comments
Written exam using the course notes. Reading and discussion around a research paper related to the course.
Term 2 Assessment - type
- N/A
Term 2 Assessment - comments
Not applicable
Term 3 Assessment - type
- Oral examination
Term 3 Assessment - comments
Written exam using the course notes. Reading and discussion around a research paper related to the course.
Resit Assessment - Term 1 (B1BA1) - Comments
Not applicable
Type of Teaching Activity/Activities
- Cours (cours magistraux; conférences)
- Préparations, travaux, recherches d'information