Study programme 2023-2024Français
Plasma Technologies for the Treatment of Materials
Programme component of Master's in Chemistry : Research Focus (MONS) (day schedule) à la Faculty of Science

CodeTypeHead of UE Department’s
contact details
Teacher(s)
US-M2-CHIMFA-013-MOptional UESNYDERS RonyS882 - Chimie des Interactions Plasma-Surface
  • KONSTANTINIDIS Stephanos
  • SNYDERS Rony

Language
of instruction
Language
of assessment
HT(*) HTPE(*) HTPS(*) HR(*) HD(*) CreditsWeighting Term
  • Français
Français2012150033.001st term

AA CodeTeaching Activity (AA) HT(*) HTPE(*) HTPS(*) HR(*) HD(*) Term Weighting
S-CHIM-120Plasma Technologies for the Treatment of Materials (Part A)2001500Q1
S-CHIM-150Plasma Technologies for the Treatment of Materials (Part B)012000Q1

Overall mark : the assessments of each AA result in an overall mark for the UE.
Programme component

Objectives of Programme's Learning Outcomes

  • Have acquired professional skills in relation to the objective defining the degree.
    • Specialise in at least one sub-domain of chemistry.
    • Learn about scientific research and the world of research.
    • Integrate into an inter-university environment and conduct scientific collaborations.
  • Help lead and complete a major development project, individually or in teams, related to chemistry.
    • Mobilise, articulate and promote the knowledge and skills acquired.
    • Demonstrate independence and their ability to work alone or in teams.
  • Manage research, development and innovation within chemistry and/or its applications.
    • Understand unprecedented problems in chemistry.
    • Mobilise their knowledge effectively, identify their limits, conduct methodical research and critically analyse scientifically valid information.
    • Possibly propose innovative solutions to targeted problems, which also requires attentiveness and mutual respect, as well as argue and establish constructive debates.

Learning Outcomes of UE

At the end of the course the student will be able to: - Describe the specificities of cold plasma - Describe the operation of a magnetron discharge - Describe the operation of a PECVD process - Explain the mechanisms involved in the synthesis of thin films by plasma technologies

UE Content: description and pedagogical relevance

Description of the plasma environment, characteristics of cold plasma, magnetron sputtering (reactive), pulsed methods, PECVD processes, plasma polymerization, thin film growth

Prior Experience

Kinetic theory of gases , electricity, atomic structure , statistical distributions , electromagnetic spectrum, diffusion phenomenon , crystal structure of solids, spectroscopic characterization of surfaces

Type(s) and mode(s) of Q1 UE assessment

  • Oral examination - Face-to-face

Q1 UE Assessment Comments

Reading and preparing an article not related to the course. This is presented during the exam and is followed by a question and answer session.

Method of calculating the overall mark for the Q1 UE assessment


10 points for the presentation of the article and 10 points for the discussion.

Type(s) and mode(s) of Q1 UE resit assessment (BAB1)

  • Oral examination - Face-to-face

Q1 UE Resit Assessment Comments (BAB1)

Not applicable

Method of calculating the overall mark for the Q1 UE resit assessment

pas applicable

Type(s) and mode(s) of Q3 UE assessment

  • Oral examination - Face-to-face
  • Oral presentation - Face-to-face

Q3 UE Assessment Comments

Reading and preparing an article not related to the course. This is presented during the exam and is followed by a question and answer session.

Method of calculating the overall mark for the Q3 UE assessment

10 points for the presentation of the article and 10 points for the discussion.

Type of Teaching Activity/Activities

AAType of Teaching Activity/Activities
S-CHIM-120
  • Cours magistraux
  • Préparations, travaux, recherches d'information
S-CHIM-150
  • Travaux de laboratoire

Mode of delivery

AAMode of delivery
S-CHIM-120
  • Face-to-face
S-CHIM-150
  • Face-to-face

Required Learning Resources/Tools

AARequired Learning Resources/Tools
S-CHIM-120Slides containing the figures are available
S-CHIM-150none

Recommended Learning Resources/Tools

AARecommended Learning Resources/Tools
S-CHIM-120Not applicable
S-CHIM-150None

Other Recommended Reading

AAOther Recommended Reading
S-CHIM-120B. Chapman, Glow Discharge Processes: Sputtering and Plasma Etching, Wiley & Sons D. L. Smith, Thin Films Deposition, McGraw-Hill, Inc. M. Ohring, Materials Sciences of Thin Films, Academic Press
S-CHIM-150Not applicable
(*) HT : Hours of theory - HTPE : Hours of in-class exercices - HTPS : hours of practical work - HD : HMiscellaneous time - HR : Hours of remedial classes. - Per. (Period), Y=Year, Q1=1st term et Q2=2nd term
Date de dernière mise à jour de la fiche ECTS par l'enseignant : 15/05/2023
Date de dernière génération automatique de la page : 04/05/2024
20, place du Parc, B7000 Mons - Belgique
Tél: +32 (0)65 373111
Courriel: info.mons@umons.ac.be