Study programme 2023-2024 | Français | ||
Plasma Technologies for the Treatment of Materials | |||
Programme component of Master's in Chemistry : Research Focus (MONS) (day schedule) à la Faculty of Science |
Code | Type | Head of UE | Department’s contact details | Teacher(s) |
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US-M2-CHIMFA-013-M | Optional UE | SNYDERS Rony | S882 - Chimie des Interactions Plasma-Surface |
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Language of instruction | Language of assessment | HT(*) | HTPE(*) | HTPS(*) | HR(*) | HD(*) | Credits | Weighting | Term |
---|---|---|---|---|---|---|---|---|---|
| Français | 20 | 12 | 15 | 0 | 0 | 3 | 3.00 | 1st term |
AA Code | Teaching Activity (AA) | HT(*) | HTPE(*) | HTPS(*) | HR(*) | HD(*) | Term | Weighting |
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S-CHIM-120 | Plasma Technologies for the Treatment of Materials (Part A) | 20 | 0 | 15 | 0 | 0 | Q1 | |
S-CHIM-150 | Plasma Technologies for the Treatment of Materials (Part B) | 0 | 12 | 0 | 0 | 0 | Q1 |
Programme component |
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Objectives of Programme's Learning Outcomes
Learning Outcomes of UE
At the end of the course the student will be able to: - Describe the specificities of cold plasma - Describe the operation of a magnetron discharge - Describe the operation of a PECVD process - Explain the mechanisms involved in the synthesis of thin films by plasma technologies
UE Content: description and pedagogical relevance
Description of the plasma environment, characteristics of cold plasma, magnetron sputtering (reactive), pulsed methods, PECVD processes, plasma polymerization, thin film growth
Prior Experience
Kinetic theory of gases , electricity, atomic structure , statistical distributions , electromagnetic spectrum, diffusion phenomenon , crystal structure of solids, spectroscopic characterization of surfaces
Type(s) and mode(s) of Q1 UE assessment
Q1 UE Assessment Comments
Reading and preparing an article not related to the course. This is presented during the exam and is followed by a question and answer session.
Method of calculating the overall mark for the Q1 UE assessment
10 points for the presentation of the article and 10 points for the discussion.
Type(s) and mode(s) of Q1 UE resit assessment (BAB1)
Q1 UE Resit Assessment Comments (BAB1)
Not applicable
Method of calculating the overall mark for the Q1 UE resit assessment
pas applicable
Type(s) and mode(s) of Q3 UE assessment
Q3 UE Assessment Comments
Reading and preparing an article not related to the course. This is presented during the exam and is followed by a question and answer session.
Method of calculating the overall mark for the Q3 UE assessment
10 points for the presentation of the article and 10 points for the discussion.
Type of Teaching Activity/Activities
AA | Type of Teaching Activity/Activities |
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S-CHIM-120 |
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S-CHIM-150 |
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Mode of delivery
AA | Mode of delivery |
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S-CHIM-120 |
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S-CHIM-150 |
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Required Learning Resources/Tools
AA | Required Learning Resources/Tools |
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S-CHIM-120 | Slides containing the figures are available |
S-CHIM-150 | none |
Recommended Learning Resources/Tools
AA | Recommended Learning Resources/Tools |
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S-CHIM-120 | Not applicable |
S-CHIM-150 | None |
Other Recommended Reading
AA | Other Recommended Reading |
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S-CHIM-120 | B. Chapman, Glow Discharge Processes: Sputtering and Plasma Etching, Wiley & Sons D. L. Smith, Thin Films Deposition, McGraw-Hill, Inc. M. Ohring, Materials Sciences of Thin Films, Academic Press |
S-CHIM-150 | Not applicable |