 | Study programme 2019-2020 | Français | |
 | Technologie plasma pour le traitement des matériaux | ||
Programme component of Master's in Physics à la Faculty of Science |
| Students are asked to consult the ECTS course descriptions for each learning activity (AA) to know what assessment methods are planned for the end of Q3 |
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| Code | Type | Head of UE | Department’s contact details | Teacher(s) |
|---|---|---|---|---|
| US-M1-SCPHYS-019-M | Optional UE | SNYDERS Rony | S882 - Chimie des Interactions Plasma-Surface |
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| Language of instruction | Language of assessment | HT(*) | HTPE(*) | HTPS(*) | HR(*) | HD(*) | Credits | Weighting | Term |
|---|---|---|---|---|---|---|---|---|---|
| Français | 15 | 0 | 15 | 0 | 0 | 3 | 3.00 | 1st term |
| AA Code | Teaching Activity (AA) | HT(*) | HTPE(*) | HTPS(*) | HR(*) | HD(*) | Term | Weighting |
|---|---|---|---|---|---|---|---|---|
| S-CHIM-120 | Plasma Technology for the Treatment of Materials (Part A) | 15 | 0 | 15 | 0 | 0 | Q1 | 100.00% |
| Programme component |
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Objectives of Programme's Learning Outcomes
- Master expertise.
- Have developed the knowledge and skills acquired in the previous cycle to a level that extends beyond the Bachelor's course in Physics, and which provides the basis for the development and implementation of original ideas in a professional context.
- Have reached a level of knowledge and skill giving them access to the third cycle of the study programme / doctoral studies (only for two-year Master courses).
- Have a creative and rigorous scientific approach
- Gather and interpret relevant scientific data and critically analyse it, distinguising working hypotheses of proven facts.
- Apply their knowledge, understanding and ability to solve problems in new or unfamiliar environments and in multidisciplinary contexts related to physical sciences.
Learning Outcomes of UE
At the end of the course the student will be able to: - Describe the specificities of cold plasma - Describe the operation of a magnetron discharge - Describe the operation of a PECVD process - Explain the mechanisms involved in the synthesis of thin films by plasma technologies
Content of UE
Description of the plasma environment, characteristics of cold plasma, magnetron sputtering (reactive), pulsed methods, PECVD processes, plasma polymerization, thin film growth
Prior Experience
Kinetic theory of gases , electricity, atomic structure , statistical distributions , electromagnetic spectrum, diffusion phenomenon , crystal structure of solids, spectroscopic characterization of surfaces
Type of Assessment for UE in Q1
- Presentation and/or works
- Oral examination
Q1 UE Assessment Comments
Written exam using the course notes. Reading and discussion around a research paper related to the course.
Type of Assessment for UE in Q3
- Presentation and/or works
- Oral examination
Q3 UE Assessment Comments
Written exam using the course notes. Reading and discussion around a research paper related to the course.
Type of Resit Assessment for UE in Q1 (BAB1)
- Presentation and/or works
- Oral examination
Q1 UE Resit Assessment Comments (BAB1)
Not applicable
Type of Teaching Activity/Activities
| AA | Type of Teaching Activity/Activities |
|---|---|
| S-CHIM-120 |
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Mode of delivery
| AA | Mode of delivery |
|---|---|
| S-CHIM-120 |
|
Required Reading
| AA | |
|---|---|
| S-CHIM-120 |
Required Learning Resources/Tools
| AA | Required Learning Resources/Tools |
|---|---|
| S-CHIM-120 | Slides containing the figures are available |
Recommended Reading
| AA | |
|---|---|
| S-CHIM-120 |
Recommended Learning Resources/Tools
| AA | Recommended Learning Resources/Tools |
|---|---|
| S-CHIM-120 | Not applicable |
Other Recommended Reading
| AA | Other Recommended Reading |
|---|---|
| S-CHIM-120 | B. Chapman, Glow Discharge Processes: Sputtering and Plasma Etching, Wiley & Sons D. L. Smith, Thin Films Deposition, McGraw-Hill, Inc. M. Ohring, Materials Sciences of Thin Films, Academic Press |
Grade Deferrals of AAs from one year to the next
| AA | Grade Deferrals of AAs from one year to the next |
|---|---|
| S-CHIM-120 | Unauthorized |