 | Study programme 2018-2019 | Français | |
 | Plasma Technology for the Treatment of Materials (Part A) | ||
Activité d'apprentissage à la Faculty of Science |
| Code | Lecturer(s) | Associate Lecturer(s) | Subsitute Lecturer(s) et other(s) |
|---|---|---|---|
| S-CHIM-120 |
|
| Language of instruction | Language of assessment | HT(*) | HTPE(*) | HTPS(*) | HR(*) | HD(*) | Term |
|---|---|---|---|---|---|---|---|
| Français | Français | 15 | 0 | 15 | 0 | 0 | Q1 |
Content of Learning Activity
Description of the plasma environment, characteristics of cold plasma, magnetron sputtering (reactive), pulsed methods, PECVD processes, plasma polymerization, thin film growth
Required Learning Resources/Tools
Slides containing the figures are available
Recommended Learning Resources/Tools
Not applicable
Other Recommended Reading
B. Chapman, Glow Discharge Processes: Sputtering and Plasma Etching, Wiley & Sons D. L. Smith, Thin Films Deposition, McGraw-Hill, Inc. M. Ohring, Materials Sciences of Thin Films, Academic Press
Mode of delivery
- Face to face
Type of Teaching Activity/Activities
- Cours magistraux
- Conférences
- Préparations, travaux, recherches d'information
Evaluations
The assessment methods of the Learning Activity (AA) are specified in the course description of the corresponding Educational Component (UE)